| 초록 |
Typical 2-D projections of ordered block copolymer morphologies after assembly in thin films include periodic lines or hexagonal arrays of spots, and therefore may not be suitable for patterning even strictly periodic device-oriented arrays consisting, for example, of lines and spots, such as a checkerboard trimming pattern (dashed lines and, alternating lines and dashed lines) used in the fabrication of DRAM. Here, we studied the directed assembly of the asymmetric ternary blends of A-B block copolymer and their respective homopolymers (A and B) on a checkerboard chemical pattern which was fabricated by e-beam lithography, controlling the periodicity, length, and spacing of the exposed lines or dashed lines. The degree of perfection and domain uniformity of the assembled block copolymer was quantified as a function of overall composition of constituent polymers and the total homopolymer fraction, and the fraction of the chemical pattern that was preferentially wet by A. |
