| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Nanoparticle Arrangements in the Presence of Block CopolymerTemplate Films |
| 초록 |
Nano-objects have been issued because of their own photonic, electronic, magnetic properties. However, to use these properties for nano-fabrications, assembly and integration of nano-objects are inevitably required. Block copolymers are another well known to spontaneously form a wide range of nanostructures and block copolymer thin film can easily form the nano-sized one-dimensional pattern. In this presentation, we would like to introduce the new approach to induce the one-dimensional nano-object patterning on perpendicularly oriented polystyrene-block-poly(methyl methacrylate) thin films. Our concept is based on the properties of block copolymer thin films that simultaneously form the topographical and chemical nano-patterns. We used selective solvent for the block copolymer for forming topographical pattern, and then we realized the 1-D nano-object pattern in the groove of the pattern and on the top of the patterns. |
| 저자 |
손정곤1, 배완기1, 강희만2, Paul F. Nealey3, 차국헌1
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| 소속 |
1서울대, 2Univ. of Wisconsion-Madison, 3Univ. of Wisconsin-Madison |
| 키워드 |
Nanoparticles; Alignment; Block copolymer
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| E-Mail |
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