| 학회 |
한국고분자학회 |
| 학술대회 |
2014년 가을 (10/06 ~ 10/08, 제주 ICC) |
| 권호 |
39권 2호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Graphoepitaxally assembled block copolymer pattern multiplication assisted by atomic layer deposition for sub-10-nm scale nanopatterning |
| 초록 |
We have demonstrated 5-nm-scale nanopatterning relying on BCP self-assembly successfully integrated with ALD assisted pattern multiplication. While directed self-assembly of BCPs generates highly ordered line array or hexagonal dot array with the pattern periodicity of 28 nm and the minimum feature size of 14 nm, pattern density multiplication employing ALD successfully reduces the pattern periodicity down to 14 nm and minimum feature size down to 5 nm. Self-limiting ALD process enable the low temperature, conformal deposition of 5 nm thick spacer layer directly at the surface of organic BCP patterns. This ALD assisted pattern multiplication addresses the intrinsic thermodynamic limitations of low χ BCPs for sub-10-nm scale downscaling. Moreover, this approach offers a general strategy for scalable ultrafi ne nanopatterning without burden for multiple overlay control and high cost lithographic tools. |
| 저자 |
전현욱1, 문형석2, 김상욱1
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| 소속 |
1KAIST-IBS, 2KAIST |
| 키워드 |
Blockcopolymer; Atomic layer deposition; nanopattern
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| E-Mail |
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