| 학회 |
한국고분자학회 |
| 학술대회 |
2016년 봄 (04/06 ~ 04/08, 대전컨벤션센터) |
| 권호 |
41권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Self-assembled block copolymer pattern shrinkage by metal oxide deposition. |
| 초록 |
Block Copolymer Patterning has distinct advantages in diverse morphology variation, periodic structural ordering and parallel processing. However, low χ value of P(S-b-MMA) which limits the patterning below 10 nanometer feature size. Here we report sub-10 nanometer block copolymer patterning with inorganic space layer deposited by atomic layer deposition (ALD). This ALD induced block copolymer patterning offer potential functionality in semiconductor applications which requires nanoscale patterning |
| 저자 |
김준수1, 문형석2, 차승근1, 김상욱1
|
| 소속 |
1KAIST, 2Kitech |
| 키워드 |
Block copolymer; nanopatterning
|
| E-Mail |
|
