| 초록 |
Controlled/living radical polymerizations (CRPs) can make a product which has designed molecular weight, low molecular weight distribution and well defined structure. Especially uniform branched polymer can be made by CRP, due to the polymerization mechanism; simultaneous generation and growth of chains during polymerization. In this study, branched ArF photoresist was synthesized via reversible addition-fragmentation chain transfer (RAFT) polymerization, one of well-defined controlled/living radical polymerization. Three methacrylate monomers for lithographic functionalities, ethylene glycol dimethacrylate for branching site, and cyanopropyldithionaphthalate (CPDN) were components for this system. Characterizations of the product by GPC and 1H-NMR were done. |
