| 초록 |
In this study, we prepared acid-stimulated chain-scission polymers. Chain-scission polymers have been developed for lower line width roughness (LWR) of nanopattern fabricated through photolithography. Since the polymer can be degraded in monomeric unit, LWR problem should be improved. The chain-scission polymers are a kind of tertiary polyester which can be hydrolyzed into carboxylic acid and vinyl group under acidic and heated condition. The polymers are mainly composed of aromatic groups for high etching resistance and high glass transition temperature. The solubility of the polymers into a solvent is determined by the physical structure of the polymers. |
