| 초록 |
Nanopatternable mold capable of retaining water is desirable for various soft lithographic techniques such as microcontact printing for transfer-printing with polar inks or biomolecules. In general, polydimethylsiloxane has been the best choice of material for molds or stamps used in soft lithographic techniques such as microcontact printing and solvent-assisted micromolding. However, nanostructure patterning and contact printing of polar molecules in nano-scale features using a PDMS mold remains a problem. We introduce a UV-curable composite elastomer capable of creating nanopatterns on the surface and permeable to water and organic solvents, thus enabling it to be used to conduct nano-scale chemical patterning as well as physical patterning. This composite mold enables soft lithographic techniques to be performed for a variety of patterning applications, such as homogeneous nanostructure replication and nano-patterning of polar biomolecules. |
