| 초록 |
Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae have received great attention for their applicability to nanolithography and high density storage devices. Although multiple shapes are required for many nanolithographic application, block copolymer have a only single shape at a given condition. There are some methods to achive multiple pattern, but these methods only make limited pattern. In this study, we prepared and coating the binary blends of polystyrene-block-polydimethylsiloxane (as-PS-b-PDMS) and polystyrene-block- poly(2-vinyl pyridine) (as PMMA-b-P2VP) diblock copolymer on silicon wafer. By applying reactive ion etching and coating PS brush on film after photolithography, the blends separated by their wetting characteristics. The blends on film showed various pattern due to their macrophase and microphase separation of each block. |
