| 초록 |
The precise control of the orientation of block copolymers deposited in a thin film is crucial to fully exploit the potential of these materials for applications in nanotechnology. The control of the orientation is challenging as block copolymer nanodomains spontaneously self-assemble in a configuration that minimizes the total free energy of the system. In order to establish a perpendicular orientation, that possesses a higher potential for applications, we present a new processing route, based on the use of surfactants, to control the orientation of PS-b-PMMA thin films. The simplicity of this technique, which does not require any heavy equipment, makes it promising for further development in that field. The advantage is that a pattern can be created on the upper part of the film after a very short annealing time, on any substrates. We verified the mechanisms of surfactant-assisted perpendicular orientation of thin block films using AFM, SEM, GISAXS and Neutron Reflectivity. |
