| 초록 |
Block copolymer (BCP) nanopatterning has been considered as one of the promising candidates overcoming the limitations of conventional lithography methods. To employ BCP in nanopatterning, perpendicular domain orientation of BCP is required. However, to control the domain orientation is often challenging because of the intrinsic surface energy difference between blocks and thus the perpendicular orientation is usually obtained with additional processes such as brush polymer grafting and grapho/chemoepitaxy. Here, we introduce a facile method to obtain perpendicular domain orientation of BCPs using the air-water interfacial layer (AWIL) of short BCPs. By coating AWIL onto various target substrates using Langmuir-Blodgett method, the surface of substrates can be easily neutralized and therefore, induce perpendicular orientation for overlying BCP films. In addition, AWIL can neutralize the free surface: even high-χ BCP is successfully self-assembled with perpendicular orientation. |
