| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 봄 (04/08 ~ 04/10, 대전컨벤션센터) |
| 권호 |
40권 1호 |
| 발표분야 |
고분자가공/복합재료 |
| 제목 |
High-resolution micropatterning of carbon nanomaterial thin films for electronic devices. |
| 초록 |
We report high-resolution micropattering method for reduced graphene oxide (rGO) and single wall carbon nanotubes (SWNT) thin film using surface energy engineering. We use plasma treatment for surface energy enginnering and elastomeric molds for patterning. With surface energy engineered pre-patterned molds, we can fabricate well-defined micropatterning of carbon nonmaterial thin film followed by only few step. This technique use adhesion force between plasma treated mold and thin film. The plasma treatment generating oxygen group on the each surface, induce mold to adhere to thin film stronger. We applied this technique to memory device. We reported high performance flash memory device base on micropatterned rGO thin film. In this study patterned rGO thin film show better performance than non-patterned one. Our patterning method still has great potential to application and improvement and will make novel future electronic device. |
| 저자 |
이성민, 정대성, 장석태
|
| 소속 |
중앙대 |
| 키워드 |
Graphene; micropatterning; electronicdivice
|
| E-Mail |
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