| 초록 |
This is the first report on the fabrication of defect-free 2D submicron structures via interference lithography over 100μm of thickness. Poly(glycidyl methacrylate-co-acryloisobutyl POSS) (PGP), which is highly transparent, photo-active, and mechanically robust, and best suited to the fabrication of the ultrahigh submicron structures, was synthesized via radical polymerization. The PGP-based 2D-submicron structure has shown 17% and 10% of enhanced elastic modulus and hardness, respectively, compared to the PGMA-based 2D-structure due to the incorporation of robust POSS molecules. The possible application of PGP in 3D patterned structures was also confirmed by the fabrication of ~90μm-thick holographic patterns via a proximity-field nanopatterning technique. These results suggest the potential of the utilization of submicron structures as an ideal platform for the microelectromechanical systems and microfluidics, data storage systems, energy devices, sensors and portable devices etc. |
