| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
38권 2호 |
| 발표분야 |
Molecular Self-Assembly from Small Molecules and Liquid Crystals to Macromolecules |
| 제목 |
Flexible and Transferable Block Copolymer Lithography |
| 초록 |
Nanoscale patterning technology scalable to large-area processing of flexible and nonplanar substrates is a major bottleneck for the development of flexible and three-dimensionally integrated nanodevices. Self-assembled nanopatterning employing block copolymer thin film is the ultimate technology to create dense, sub-10-nm scale features. Nevertheless, this bottom-up approach is considered intrinsic two-dimensional patterning method predominantly utilized for hard and flat inorganic substrates. We demonstrate mechanically compliant, transferrable and disposable chemically modified graphene film can facilitate the self-assembled nanopatterning of conventional flexible and three-dimensional substrates. |
| 저자 |
김주영, 김봉훈, 정성준, 진형민, 김상욱
|
| 소속 |
KAIST |
| 키워드 |
block copolymer; flexible
|
| E-Mail |
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