| 초록 |
A great challenge facing the fabrication of ultrathin supercapacitor components, specifically their porous electrodes, is whether such components can be integrated with the fabrication of electronic devices, i.e., semiconductor fabrication processes. Here, we introduce the lithographic fabrication of submicrometre-pore-patterned carbon for supercapacitor electrodes. The pore patterns designed by multi-beam interference lithography and direct carbonisation of the photoresist pattern produced pore-patterned carbon films. We also employ a doping to introduce nitrogen atoms into the carbon, which was intended to enhance the carbon’s capacitive properties. Our pore-patterned structures and fabrication approach will be beneficial in energy storage and conversion devices and in the development of various mobile and wearable biosensors. |
