| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Cross-Linking using Atomic Force Microscopy on PAG Polymer |
| 초록 |
Photoacid generator (PAG) has been widely used as a key component for a chemically amplified photo resist. The PAG monomer containing an arylsulfonium triflate group was synthesized and its polymerization behavior was investigated. The synthesized PAG monomer and PAG polymer were analyzed by various analytical techniques such as Fourier transform infrared spectroscopy, nuclear magnetic resonance spectroscopy, thermograimetric analysis, differential scanning calorimetry, gel permeation chromatography and ultraviolet spectrometry. As PAG polymer has a good thermal stability and has a good electron acceptor as showing chemical structure of the PAG. The cross-linking patterns were fabricated using atomic force microscopy lithography. The patterning process was done on a PAG polymer film at various tip speeds and applied positive bias on a tip. The full width at half maximum was decreased according to increasing tip speed at the same voltage and decreasing bias at the same tip speed. |
| 저자 |
정미혜, 아쇽 나뉴 사가, 김상현, 이고은, 이해원
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| 소속 |
한양대 |
| 키워드 |
Photoacid generator; Atomic force microscope; Lithography; Cross-Linking
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| E-Mail |
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