| 초록 |
Free-standing periodic mesoporous organosilica (PMO) films were prepared using an ethylene-bridged organosilica as silica source and triblock copolymer (F127) as template via evaporation-induced self-assembly (EISA). Surface area and pore diameter of the PMO film were 616 m2/g and 74.1 Å, respectively. The thickness of the PMO film can be controlled from 1.9 to 44.1 μm using the different amount of reactant solution. After the pyrolysis of the PMO films with ethylene-bridged organosilica moieties in the pore walls under an Ar flow at temperatures ranging from 620 to 1100 oC, free-standing mesoporous silica/carbon composite films were obtained. The composite films had a highly ordered periodic mesostructure with a Ia3d symmetry. With the increase of the pyrolysis temperature up to 1100 oC, the thickness of the silica/carbon composite films were controlled from 16.1 to 35.6 μm. |
