| 초록 |
Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. To solve the problem we synthesized a novel miktoarm block copolymer capable of cleavage of one block by ultraviolet. By ultraviolet irradiation, original cylindrical nanodomains were successfully transformed to lamellar nanodomains. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept to fabricate dual nanopatterns is applied to any block copolymer, it could be employed as next-generation nanolithography. |
