| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 가을 (10/07 ~ 10/08, 대구 EXCO) |
| 권호 |
35권 2호 |
| 발표분야 |
분자전자소재 및 소자 |
| 제목 |
A Study of Hard-Mask using Organic-inorganic Hybrid Materials |
| 초록 |
For the next technological generations of integrated circuits, the traditional challenges faced by etch plasmas become more and more difficult. Metallic hard masks can help thanks to their high selectivity toward materials. In this work we discuss the interesting hard mask material and choosing the optimum dry etch using the hybrid hard-mask which contains organic and inorganic materials. The inorganic group was much easier to the hard mask than photo resist and the organic group was the etching to the substrate in organic-inorganic hybrid form. After etching process, we characterized the optical and morphological properties to the hard mask. In conclusion, the organic-inorganic hybrid polymer will become useful material to single-layered hard mask film for high integrated circuit. |
| 저자 |
유제정1, 송재동1, 이성구1, 이경균1, 황석호2, 김상범1
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| 소속 |
1한국생산기술(연), 2단국대 |
| 키워드 |
Organic-inorganic hybrid polymer; hard mask; Etching
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| E-Mail |
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