| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO)) |
| 권호 |
40권 2호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Graphene Oxide Monolayers for Controlled of Block Copolymer Orientation. |
| 초록 |
Nanometer-scale patterning in thin films of self-assembling block copolymers has inspired a variety of new applications. By introducing graphene oxide (GO) monolayers, a perpendicular orientation of deuterated polystyrene-block-polymethylmethacrylate (dPS-b-PMMA) microdomains in thin films could be achieved. GO sheets prepared using the Hummers and Offeman's method were deposited by Langmuir-Schaefer (LS) technique at the gas-liquid interface. We found that the dPS-b-PMMA thin film on the GO monolayers formed the perpendicular orientation of lamellar structures through the thermal annealing. This is probably due to neutral interaction with amphiphilic GO sheets with both dPS and PMMA. The neutron reflectivity (NR) and atomic force microscopy (AFM) techniques use to evaluate the effect of GO on microdomain orientations of dPS-b-PMMA thin film. By this method, block copolymer orientation can provide critical routes for flexible transparent polymer based-solar cell device application. |
| 저자 |
구자승1, 최재학2, 김혜리1, 김태호3, 최기인1
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| 소속 |
1한국원자력(연), 2충남대, 3한국기술교육대 |
| 키워드 |
Graphene Oxide; Block Copolymer; Self-Assembly
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| E-Mail |
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