| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 봄 (04/08 ~ 04/09, 대전컨벤션센터) |
| 권호 |
35권 1호 |
| 발표분야 |
신진연구자 특별 심포지움 |
| 제목 |
Siloxane block copolymers for nanofabrication |
| 초록 |
Monolayer patterns of block copolymer (BCP) microdomains have been pursued for applications in sub-15 nm nanolithography. The two critical issues are how to obtain reliable long-range ordering of features with minimum defect densities and how to successfully transfer the patterns into other functional materials. We can readily fabricate exceptionally well-ordered and robust nanoscale patterns from poly(styrene-b-dimethylsiloxane) (PS-PDMS) BCPs, which have a very large interaction parameter between the blocks compared to other commonly used BCPs. The self-assembly of the BCP can be templated using an array of nanoscale topographical elements that act as surrogates for the minority domains of the block copolymer. The solvent vapor induced tunability of pattern dimension and morphology will also be discussed. In addition, methods to transfer the generated patterns into various kinds of materials are described as well. |
| 저자 |
정연식 |
| 소속 |
KAIST |
| 키워드 |
block copolymer; nanofabrication; devices
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| E-Mail |
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