| 초록 |
As demand for smaller and more efficient devices grows, conventional lithography based patterning process has faced to resolution limit. Self-assembly of block copolymer (BCP) is a promising method in nanostructure patterning industry. BCP constructs diverse structures according to phase separation condition; Χ(Flory-Huggins interaction parameter), N(degree of polymerization) and fA(volume fraction). We introduce solvent vapor annealing (SVA) system which provides systematically controlled solvent/N2 mixture atmosphere in a reproducible manner. Through our system, BCP thin film rapidly constructs uniform nano-structures in a large area and swelling gradients in a specific area of film by changing time-dependently programmed flow ratio. We expect to induce BCP alignment propagating from ordered structure to disordered structure. In-situ film thickness is measured by Filmetrics and the morphology of film is presented in SEM images after reactive ion etching (RIE) treatment. |
