| 초록 |
Supramolecular self assembly has been big interest as new method for bottom up lithography. It has great advantages not only for building nano structures by easy method but also tuning the film surface properties by end-functionalized polymer. Two end-functionalized polymers used which are mono-end-sulfornated polystyrene(SPS) and mono-end-aminated poly(2-vinylpyridine)(AP2VP). Its behavior looks like block copolymer self assembly because two polymers make ionic bonding by functionalized groups. We annealed film using several solvents(benzene, chloroform, ethanol, etc..) to control its morphology. Then, We obtained nanoporous structures when used ethanol solvent. |
