| 초록 |
Fabrication of subwavelength nanohole array has been attempted due to its promising applications. Furthermore, recent development of nanofabrication methods can realize size miniaturization of nanohole array. However, typical high-resolution fabrication methods suffer from low-throughput and high-cost. Herein, we report facile strategy for high-resolution nanohole array. We used solvent-assisted nano-transfer printing to fabricate well-aligned Cr NWs from duplication of BCP template. Then, array of nanowells on silicon substrate were fabricated by the Bosch process. Au nanohole array was obtained via Au evaporation onto Si master and transferred to quartz substrate, resulting in nanohole array (＞400 holes/μm2). The transmission characteristics of Au film is changed by forming nanoholes. A resonance peak at 650 nm is observed, suggesting that the new peak stem from the structural effect. And it shows sensitivity against to the change of the refractive index of surrounding medium. |
