| 초록 |
Nowadays, block copolymer gains great attention because of its applicability to lithography. Some researchers developed photo-induced phase transition of block copolymer such as order-to-disorder, disorder-to-order. To make it, I used polystyrene-poly(2-vinyl pyridine)(PS-P2VP), polystyrene-poly(tert-butoxy styrene)(PS-PtBOS), 2-(4-methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine as photo acid generator(PAG). When PS-P2VP and PS-PtBOS are mixed, they can not interact each other. On the other hand, PtBOS group is changed to poly(hydroxy styrene)(PHS) under UV with PAG because of photolysis. Then. P2VP and PHG can be interacted each other via hydrogen bonding. So, our group could induce order-to-order transition of block copolymer under UV such as cylinder to lamellae and sphere to cylinder. Finally, if I make block copolymer film on a subsstrate, I am expecting that two kind of patterns can be fabricated on a substrate simultaneously . |
