| 학회 | 한국화학공학회 |
| 학술대회 | 2012년 봄 (04/25 ~ 04/27, 제주 ICC) |
| 권호 | 18권 1호, p.1398 |
| 발표분야 | 신진연구자 심포지엄 |
| 제목 | Sub-10 nm Patterns by Hierarchical Self-Assembly of Si-Containing Block Copolymers |
| 초록 | Block copolymers with a Si-containing block are particularly attractive due to their high etch contrast and high interaction parameter, which leads to a microphase-separation below 10 nm and a convenience for transfer of the pattern into other materials. I presented a hierarchical strategy for templating of small period PS-b-PDMS block copolymers using a topographical pattern formed from a larger period block copolymer which can itself be templated using features produced by electron-beam lithography. And, I show how patterns consisting of coexisting sub-10 nm spheres and cylinders and sphere patterns with a range of periods can be created using a combination of serial solvent anneal processes and electron-beam irradiation of selected areas of a film of PS-b-PDMS. These techniques offer the possibility of forming a wide range of aperiodic pattern geometries and significantly extend the ability of block copolymer lithography to produce patterns essential for nanoscale device fabrication. |
| 저자 | 손정곤 |
| 소속 | KIST 광전하이브리드연구센터 |
| 키워드 | Block Copolymer; Nano-patterning; Self-assembly |
| 원문파일 | 초록 보기 |
