| 학회 |
한국재료학회 |
| 학술대회 |
2010년 가을 (11/11 ~ 11/12, 무주리조트) |
| 권호 |
16권 2호 |
| 발표분야 |
F. Display and optic Materials and processing(디스플레이 및 광 재료) |
| 제목 |
Comparison of the plasma etching and chemical etching of glass |
| 초록 |
Plasma enhanced process is widely applied for micro-device industries and it derived the necessary to develop the optimal materials for the plasma processing chamber. The window glass used in the plasma processing chamber to the diagnosis the status in the chamber during the process and quartz was applied mainly. The window glass material requires high plasma etching resistance, chemical durability and transparency. However, quartz is easily etched against the fluorine based plasma or chemical agent. Various rare-earth elements containing SiO2-Al2O3 glasses were prepared and their plasma etching resistance and chemical durability was evaluated. The plasma and chemical etching behavior were estimated using X-ray photoelectron spectroscopy with depth profiling function. The glasses showed higher resistance against the fluorine plasma and fluorine based chemical etchant than quartz. All glasses were very transparent around 80% in the range of the visible light. The glasses showed enough characteristics as the window glass for the plasma processing chamber. The different mechanism between the plasma etching and the chemical etching could be understood from the XPS analysis at the plasma etched and chemically etched surface of the glasses. |
| 저자 |
Jungki Lee1, Seongjin Hwang2, Sungmin Lee1, Hyungsun Kim2
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| 소속 |
1School of Material Engineering, 2Inha Univ. |
| 키워드 |
Plasma etching; Chemical etching; glass
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| E-Mail |
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