| 초록 |
Recently, directed self-assembly (DSA) of block copolymers (BCPs) with high Flory-Huggins interaction parameter (χ) has much attracted attention. However, there still remain challenges such as further reductions of the defect density and reducing the line edge roughness and high-χ BCPs has slow self-assembly kinetics. To resolve these challenges, in this study we use lamella-forming P4VP-PDMS with an extremely large χ parameter for further enhancing pattern quality and reducing defect density. To address the slow kinetics of P4VP-b-PDMS, we adopt warm solvent annealing strategy, which can accelerate the self-assembly kinetics by adding thermal activation effect during the inter-diffusion process. Consequently, warm solvent annealing of extremely high-χ BCP (P4VP-b-PDMS) achieves remarkably improved pattern quality and rapid pattern formation within the order of minutes. Additionally, toxic solvent can be replaced with the non-toxic solvent such as ethanol in annealing process. |
