| 초록 |
The self-assembly of block copolymers can offer a simple, versatile route to nanostructured material, and has led to the development of block copolymer lithography as a viable technique for nano fabrication. Incorporation of nanoparticles using block copolymers has recently attracted attention for various applications. Here, two cylinder-forming block copolymers (PS-b-PEO and PS-b-P4VP) are mixed together to form thin films on the substrate, and then annealed in a solvent vapor. Various structures and functionalities from blends of block copolymers enables nanopatterning of inorganic materials with along the nanostructure of the film. The nanostructures of block copolymer blend films were identified by AFM, TEM and neutron reflectivity. Several types of nanoparticles were incorporated into the films through selective solubilization of chemical agents within the microdomains. The same strategy was applied to the PS-P2VP-PEO triblock copolymer and the results were compared. |
