| 초록 |
Photolithograph is an important manufacturing process that relies on using organic or polymer photoresists. Here, we demonstrate a general technique named DOLFIN to prepare photosensitive inks and direct pattern inorganic nanocrystals (NCs) and sol-gel nanomaterials. By using surface ligands with photochemically active species, NCs can be easily converted into to stabilize NCs, a series of novel NC inks that can be directly patterned not only with DUV, but also with near UV light (i-line, 365 nm), blue light (h-line, 405 nm) and even visible light (450 nm) using environmentally benign and industrially accepted solvents. Since DOLFIN is a photoresist-free method, no organic impurities are present in the patterned layers, which will help achieve good electronic and optical properties. The ability to directly pattern all-inorganic layers provides a powerful and versatile nanomanufacturing platform for solution processed thin film device fabrication. |
