| 학회 |
한국고분자학회 |
| 학술대회 |
2019년 가을 (10/09 ~ 10/11, 제주컨벤션센터) |
| 권호 |
44권 2호 |
| 발표분야 |
분자전자 부문위원회 II |
| 제목 |
Non-lithographic sub 10-micron patterning of carbon nanomaterials via EHD-printed polymer brush layers for Source/Drain of OFETs |
| 초록 |
We report on a new approach to the patterning of carbon nanomaterials via solution route by introducing the wettability pattern technique via the electrohydrodynamic (EHD) printing process. The wettability differences were successfully obtained through the treatment of PS-brush with micro-dripping mode of EHD printing up to 6 μm line width and scaled fine patterns with various shapes. Therefore, we obtained sub-micrometer scaled carbon nanomaterial patterns utilized their patterns as S/D electrodes for OFETs without using any lithographic process. In addition, the PS-brush treatment modified the surface hydrophobicity of substrates, serving as PS-brush and SiO2 bilayer dielectrics to guarantee high stability during the OFET operation. As a result, the OFETs employing S/D electrodes based on carbon nanomaterial patterns exhibited typical p-type OFETs electrical performance with negligible hysteresis. We also confirmed that a solution process based organic semiconductor deposition. |
| 저자 |
권혁진1, 이신림2, 홍지수1, 박찬언1, 정용진3, 문홍철4, 김세현2
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| 소속 |
1포항공과대, 2영남대, 3한국교통대, 4서울시립대 |
| 키워드 |
Carbon nanomaterial; Electrohydrodynamic-printing; Non-lithographic patterning; Wettability; PS-brush
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| E-Mail |
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