| 학회 |
한국공업화학회 |
| 학술대회 |
2012년 봄 (05/09 ~ 05/11, 김대중컨벤션센터) |
| 권호 |
16권 1호 |
| 발표분야 |
고분자 |
| 제목 |
Polyhedral OligomericSilsesquioxaneMoiety for Modifying Surface Properties of Polymers |
| 초록 |
Polyhedral oligomericsilsesquioxane (POSS) derivatives have recently received much attention in aerospace, biological and electronic applications due to the outstanding characters of POSS moiety such as high hydrophobicity, non-toxicity, and good mechanical and thermalproperties.In order to introduce such strong points of the moietyontothe polymeric surface, we synthesized theseries of random and block copolymers composed ofmethyl methacrylate and POSS-methacrylate moietiesand the surface properties of the polymers were systemically correlated with the results. The detailed surface characterizationsof POSS containing polymer films will be given in the meeting. |
| 저자 |
홍현기1, 손은호2, 김동균1, 송기국2, 이종찬1
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| 소속 |
1서울대, 2경희대 |
| 키워드 |
POSS; Surface analysis
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| E-Mail |
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