| 초록 |
Directed self-assembly(DSA) of block copolymer(BCP) has shown great promise especially for next-generation sub-20 nm lithography. In order to realize sub-10 nm patterning capabilities, BCPs with a large Flory-Huggins interaction parameter(χ) are required to overcome the ODT limit imposed by a BCP chains. However, in the previous approaches of DSA, annealing steps have been essentially required after spin-coating of a BCP in order to activate the polymer chains for pattern generation. Here, we introduce ultrafast and highly simplified in-situ DSA implementation based on thermally-assisted warm spin-casting (WSC), which exempts the requirement of a subsequent annealing step. We demonstrate well-ordered sub-10 nm half-pitch DSA patterns obtained by 40°C spin-casting for only 30 sec without additional annealing process. This WSC method may suggest a new route for highly productive and functional assembly solutions for variety of nanoscale building blocks. |
