| 초록 |
Three-dimensional structures in nanometer scale has a lot of potentials in its applications in wide range of areas. However, their usage has been limited due to the slow and expensive fabrication methods and limited morphologies. In this experiment, block copolymer self-assembly is utilized in effort to design a novel fabrication method for a variety of nanostructures. When given three-dimensional confinement and sufficient mobility, certain block copolymers are known to form structures that cannot be seen in typical two-dimensional conditions. To induce such effect, PS-PDMS and PS-P2VP block copolymers are placed in a template that provides a 3-dimensional cylinder confinement and annealed in solvent vapor for self-assembly. Once this is achieved, polymer chains will be used as structural directing agent through selective etching process. This method will provide a novel method that allows swift and inexpensive fabrication of various 3-dimensional nanostructures using block copolymer. |
