| 초록 |
Block copolymers (BCPs) self-assembly which has many advantages of exceptional pattern resolution, process simplicity, morphological tunability and good cost-effectiveness can effectively generate diverse structures in the size range of 5-50 nm such as dot, line, hole, and ring patterns. However, there are still remaining challenges to be resolved to realize the fast pattern formation of BCPs with high-χ interaction parameter. In this talk, we present a simple method to expedite the self-assembly by adding an appropriate polystyrene homopolymer (hPS) to poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs. We rationally provide a presentation of how hPS kinetically affects the self-assembly of PS-b-PDMS BCPs in the immersion annealing. We found the optimized annealing conditions of the mixing ratio for the PS-b-PDMS/hPS blends, showing an extremely reduced annealing time (~ 1 min) to form well-aligned nanoscale patterns. Furthermore, we show how the immersion temperature and mixing ratio of the binary solvent mixture influences the self-assembly kinetics of the PS-b-PDMS/hPS blends, suggesting a new way to improve the self-assembly kinetics. This simple and practical approach is extendable to the other BCP materials for the next-generation BCP lithography applications. |
