| 학회 |
한국고분자학회 |
| 학술대회 |
2019년 봄 (04/10 ~ 04/12, 부산컨벤션센터(BEXCO)) |
| 권호 |
44권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Hierarchical silica nanostructure fabrication for antireflective coating based on organic-inorganic hybrid |
| 초록 |
Silica nanostructures find a variety of applications including modern thin-film applications. Among the various approaches, the simplest way to control silica nanostructures is sol-gel method. However, in our work, SSQZ was used as a replacement silica precursor instead of using a sol-gel process. Since SSQZ has an amine group in the silica-based chain, it has an advantage that it is easy to bond with organic materials when compared with silsesquioxane having a si-o-si structure. In this study, coating was performed stepwise to show the hierarchical structure. First, the silica particles were coated on the substrate and the structure of ssqz was controlled by self-assembly of ABC triblock copolymer. The controlled structures exhibit antireflective properties for high performance in optoelectronic devices. The silica nanostructures were observed through AFM and SEM, and UV-vis spectrometer was used to measure antireflective properties. |
| 저자 |
최수빈1, 윤광한1, 이동익1, 곽영제2, 김승현1
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| 소속 |
1인하대, 2숭실대 |
| 키워드 |
Block copolymer; Silica nanostructure; antireflective
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| E-Mail |
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