| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Fabrication of Nano-Hole Array Pattern Using Negative Capillary Force Lithography |
| 초록 |
Capillary force lithography, when a liquid wets a capillary tube and if the wetting results in lowering the free energy, this capillary force allows the polymer melt to fill up the void space between the polymer and the mold. We use Polyurethane acrylate (PUA) mold that enough rigid and flexible for nanometer scale patterning. PUA has impermeable characteristic for air. We use this characteristic for making negative hole pattern by PUA mold having negative phase. Various sized PUA mold with 300~1000 nm are attached to Spin-coated Polystyrene(PS) polymer film on Si wafer. And temperature rise above PS polymer's glass transition temperature. Impermeability of PUA mold cause air trap between mold and PS film than rise of temperature occur air expansion. This air pressure has enough force for push down PS film against Capillary force. And we lastly confirm this phenomenon and kinetically analysis. |
| 저자 |
이민호, 유필진
|
| 소속 |
성균관대 |
| 키워드 |
Capillary force lithography; Polyurethane acrylate; patterning
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| E-Mail |
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