| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
고분자 가공/복합재료 |
| 제목 |
Free-Standing Mesoporous Silica/Carbon Composite Film with Crystalline Silica Wall from Ethyl-Bridged Organosilane |
| 초록 |
We directly prepared free-standing mesoporous silica/carbon composite films from free-standing mesoporous ethyl-bridged organosilica/surfactant mesophases. The high-quality free-standing and oriented periodic mesoporous organosilica (PMO) film was grown using surfactant-templated binuclear alkoxysilane precursor ((EtO)3Si-CH2CH2-Si(OEt)3) at the air-water interface. Well ordered mesoporous silica/carbon composite films with crystalline silica wall were obtained via pyrolysis of organosilica mesophase under argon flow at 400-900 oC. The films have a highly ordered periodic structure with a hexagonal closed-packed arrangement of channels running parallel to the surface of the film. With the pyrolysis temperature between 400 oC and 900 oC, pore diameter, surface area, and pore volume of the free-standing mesoporous silica/carbon composite films obtained from an N2 sorption isotherm were to be determined to be 29.1-18.0 , 689.5-171.7 m2g-1, and 0.64-0.18 cm3g-1, respectively. |
| 저자 |
박성수1, 정유인1, Chunfeng Xue2, Dongyuan Zhao3, 하창식2
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| 소속 |
1부산대, 2Fudan Univ., 3China |
| 키워드 |
Free-Standing Mesoporous Composite Film; Crystalline Silica Wall; Ethyl-Bridged Organosilane
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| E-Mail |
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