화학기상증착에 의한  TiO2 막의 제조, 결정구조 그리고 광촉매 활성

정상철, 이마이시 노부유키*

순천대학교 환경공학과

*큐슈대학교 기능물질과학연구소

Preparation, Crystal Structure, and Photocatalytic Activity of TiO2 Films by Chemical Vapor Deposition

Sang-Chul Jung and Nobuyuki Imaishi*

Dept. of Environmental Engineering, Sunchon National University

*Institute of Advanced Material Study, Kyushu University

Photocatalitic activities of TiO2 films were experimentally studied. TiO2 films with different crystal structures (amorphous, anatase, rutile) were prepared by a Low Pressure Metal Organic Chemical Vapor Deposition (LPMOCVD) at different reaction temperatures and also by a Sol-Gel method using TTIP (Titanium Tetra Iso-Propoxyde). The Effect of CVD preparation method, CVD reaction conditions, crystal structure and wave-length of UV light on the photocatalytic decomposition rate of methylene blue in aqueous solution were studied. First, the characteristics of CVD preparation of TiO2 films, such as the CVD film growth rate, crystal structure and morphology of the grown TiO2 films, were experimentally studied as a function of CVD reaction temperature. Secondly, photocatalitic activities of TiO2 films were evaluated by using two types of photo-reactors. The results indicated that TiO2 films prepared by CVD exhibit higher photocatalytic activity than a catalyst prepared by the Sol-Gel method. Among the CVD grown TiO2 films, anatase and rutile showed high photocatalytic activities. However, amorphous TiO2 films showed lower activities. The activity of the photocatalysts of anatase films was excellent under all types of UV-lamps. The activity of CVD-prepared anatase films was four to seven times as high as that of photocatalyst films prepared by the Sol-Gel method.