검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Current trends in 157 nm dry lithography Cefalas AC Applied Surface Science, 247(1-4), 577, 2005 |
| 2 |
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics Boher P, Evrard P, Condat O, Dos Reis C, Defranoux C, Piel JP, Stehle JL, Bellandi E Thin Solid Films, 455-56, 798, 2004 |