화학공학소재연구정보센터
검색결과 : 29건
No. Article
1 ATOMIZATION AND DISTRIBUTION OF DROPLETS IN GAS-LIQUID SPRAYS BY COAXIAL SWIRL INJECTORS
Jeong G, Lee Y, Yoon J, Jo H, Yoon Y
Atomization and Sprays, 30(8), 607, 2020
2 An impaired ubiquitin ligase complex favors initial growth of auxotrophic yeast strains in synthetic grape must
Mangado A, Tronchoni J, Morales P, Novo M, Quiros M, Gonzalez R
Applied Microbiology and Biotechnology, 99(3), 1273, 2015
3 Murine K(2P)5.1 Deficiency Has No Impact on Autoimmune Neuroinflammation due to Compensatory K2P3.1-and K(V)1.3-Dependent Mechanisms
Bittner S, Bobak N, Hofmann MS, Schuhmann MK, Ruck T, Gobel K, Bruck W, Wiendl H, Meuth SG
International Journal of Molecular Sciences, 16(8), 16880, 2015
4 Vernakalant activates human cardiac K(2P)17.1 background K+ channels
Seyler C, Schweizer PA, Zitron E, Katus HA, Thomas D
Biochemical and Biophysical Research Communications, 451(3), 415, 2014
5 Synthesis, characterization and thermal stability of Ni3P coatings on nickel
Pfeiffer H, Tancret F, Brousse T
Materials Chemistry and Physics, 92(2-3), 534, 2005
6 The herbicide 2,4-dichlorophenoxyacetic acid induces the generation of free-radicals and associated oxidative stress responses in yeast
Teixeira MC, Telo JP, Duarte NF, Sa-Correia I
Biochemical and Biophysical Research Communications, 324(3), 1101, 2004
7 Si 2p and O 1s photoemission from oxidized Si(001) surfaces depending on translational kinetic energy of incident O-2 molecules
Teraoka Y, Yoshigoe A
Applied Surface Science, 190(1-4), 75, 2002
8 Molecular basis of the voltage-dependent gating of TREK-1, a mechano-sensitive K+ channel
Maingret F, Honore E, Lazdunski M, Patel AJ
Biochemical and Biophysical Research Communications, 292(2), 339, 2002
9 Genomic and functional characteristics of novel human pancreatic 2P domain K+ channels
Girard C, Duprat F, Terrenoire C, Tinel N, Fosset M, Romey G, Lazdunski M, Lesage F
Biochemical and Biophysical Research Communications, 282(1), 249, 2001
10 Structural evolution and valence electron-state change during ultra thin silicon-oxide growth
Shimizu A, Abe S, Nakayama H, Nishino T, Iida S
Applied Surface Science, 159, 89, 2000