1 |
Capacitance-voltage measurement technique as a tool for in situ characterization of electrochemical etching of silicon Chandra S, Singh J Journal of the Electrochemical Society, 146(3), 1206, 1999 |
2 |
Anisotropic etching of silicon crystals in KOH solution - Part III - Experimental and theoretical shapes for 3D structures micro-machined in (hk0) plates Tellier CR Journal of Materials Science, 33(1), 117, 1998 |
3 |
Analysis of KOH etching of (100) silicon on insulator for the fabrication of nanoscale tips Yun MH, Burrows VA, Kozicki MN Journal of Vacuum Science & Technology B, 16(5), 2844, 1998 |
4 |
Investigation of the Processes of Electron Injection During Dissolution of P-Si in Acidic Fluoride and Alkaline Media Cattarin S, Peter LM, Riley DJ Journal of Physical Chemistry B, 101(20), 4071, 1997 |
5 |
Etch-Stop Techniques for Micromachining Collins SD Journal of the Electrochemical Society, 144(6), 2242, 1997 |
6 |
Wettability of Polished Silicon-Oxide Surfaces Thomas RR, Kaufman FB, Kirleis JT, Belsky RA Journal of the Electrochemical Society, 143(2), 643, 1996 |