검색결과 : 19건
| No. | Article |
|---|---|
| 1 |
Synthesis and characterization of microcrystalline diamond to ultrananocrystalline diamond films via Hot Filament Chemical Vapor Deposition for scaling to large area applications Fuentes-Fernandez EMA, Alcantar-Pena JJ, Lee G, Boulom A, Phan H, Smith B, Nguyen T, Sahoo S, Ruiz-Zepeda F, Arellano-Jimenez MJ, Gurman P, Martinez-Perez CA, Yacaman MJ, Katiyar RS, Auciello O Thin Solid Films, 603, 62, 2016 |
| 2 |
Deposition of Bi3.15Nd0.85Ti3O12 ferroelectric thin films on 5-inch diameter Si wafers by a modified pulsed laser deposition method Li S, Zhong XL, Jia YR, Wang JB, Li B, Tan CB, Zhou YC Thin Solid Films, 591, 126, 2015 |
| 3 |
Trajectory effect on the properties of large area ZnO thin films deposited by atmospheric pressure plasma jet Juang JY, Chou TS, Lin HT, Chou YF, Weng CC Applied Surface Science, 314, 1074, 2014 |
| 4 |
Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition Reinke M, Kuzminykh Y, Hoffmann P Thin Solid Films, 563, 56, 2014 |
| 5 |
EFFICACY OF APPLICATION OF ZINC OXIDE ON THE SURFACE OF THE NiO/Al2O3 CATALYTIC SYSTEM El-Mossalamy EH, Basahel SN, Obaid AY Chemistry and Technology of Fuels and Oils, 47(1), 23, 2011 |
| 6 |
Deposition of zinc oxide thin films by an atmospheric pressure plasma jet Hsu YW, Li HC, Yang YJ, Hsu CC Thin Solid Films, 519(10), 3095, 2011 |
| 7 |
Characterisation of thin film silicon films deposited by plasma enhanced chemical vapour deposition at 162 MHz, using a large area, scalable, multi-tile-electrode plasma source Monaghan E, Michna T, Gaman C, O'Farrel D, Ryan K, Adley D, Perova TS, Drews B, Jaskot M, Ellingboe AR Thin Solid Films, 519(20), 6884, 2011 |
| 8 |
Control of large area VHF plasma produced at high pressure Nishimiya T, Yamane T, Takeuchi Y, Yamauchi Y, Takatsuka H, Muta H, Uchino K, Kawai Y Thin Solid Films, 519(20), 6931, 2011 |
| 9 |
Uniformity of gallium doped zinc oxide thin film prepared by pulsed laser deposition Mitsugi F, Umeda Y, Sakai N, Ikegami T Thin Solid Films, 518(22), 6334, 2010 |
| 10 |
Control of plasma process instabilities during thin silicon film deposition Hrunski D, Grahlert W, Beese H, Kilper T, Gordijn A, Appenzeller W Thin Solid Films, 517(14), 4188, 2009 |