검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
High rate (similar to 3 nm/s) deposition of dense silicon nitride films at low substrate temperatures (< 150 degrees C) using the expanding thermal plasma and substrate biasing van Assche FJH, Kessels WMM, Vangheluwe R, Mischke WS, Evers M, Ab FJHVA Thin Solid Films, 484(1-2), 46, 2005 |