검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Selective titanium silicide deposition using SiH4-TiCl4-H-2 low-pressure chemical vapor deposition and film characterization Byun JS, Choi SJ, Kim JJ, Choi JT, Swenberg J, Achutharaman R Journal of the Electrochemical Society, 145(11), 3941, 1998 |