검색결과 : 4건
No. | Article |
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1 |
Silicon epitaxy using tetrasilane at low temperatures in ultra-high vacuum chemical vapor deposition Hazbun R, Hart J, Hickey R, Ghosh A, Fernando N, Zollner S, Adam TN, Kolodzey J Journal of Crystal Growth, 444, 21, 2016 |
2 |
Gas phase particle formation and elimination on Si (100) in low temperature reduced pressure chemical vapor deposition silicon-based epitaxial layers Shinriki M, Chung K, Hasaka S, Brabant P, He H, Adam TN, Sadana D Thin Solid Films, 520(8), 3190, 2012 |
3 |
Role of interfacial oxygen on the quality and strain stability of pseudomorphic silicon-germanium layers grown on Si substrates Bedell SW, Adam TN, Turansky A, Sadana DK Journal of Crystal Growth, 316(1), 101, 2011 |
4 |
Dry etching of SiGe alloys by xenon difluoride Xuan G, Adam TN, Lv PC, Sustersic N, Coppinger MJ, Kolodzey J, Suehle J, Fitzgerald E Journal of Vacuum Science & Technology A, 26(3), 385, 2008 |