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| No. | Article |
|---|---|
| 1 |
Deep-Level Transient Spectroscopy Study of the Damage-Induced in N-Type Silicon by a Gate Oxide Etching in a Chf3/Ar Plasma Adegboyega G, Perezquintana I, Poggi A, Susi E, Merli M Journal of Vacuum Science & Technology B, 15(3), 623, 1997 |