화학공학소재연구정보센터
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No. Article
1 Direct die-to-database electron beam inspection of fused silica imprint templates
Resnick DJ, Myron LJ, Thompson E, Hasebe T, Tokumoto T, Yan C, Yamamoto M, Wakamori H, Inoue M, Ainley E, Nordquist KJ, Dauksher WJ
Journal of Vacuum Science & Technology B, 24(6), 2979, 2006
2 Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates
Mancini DP, Gehoski KA, Ainley E, Nordquist KJ, Resnick DJ, Bailey TC, Sreenivasan SV, Ekerdt JG, Willson CG
Journal of Vacuum Science & Technology B, 20(6), 2896, 2002
3 Inter and intramembrane resist critical dimension uniformity across a SCALPEL mask
Nordquist K, Ainley E, Resnick DJ, Weisbrod E, Martin C, Engelstad R, Masnyj Z, Mangat P
Journal of Vacuum Science & Technology B, 18(6), 3242, 2000