화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 The Influence of Fluorine on Boron-Enhanced Diffusion in Silicon by Bf2+ Implantation Through Oxide During High-Temperature Rapid Thermal Anneal
Wang LZ, Luo MS, Tseng HH, Ajuria SA
Journal of the Electrochemical Society, 144(11), L298, 1997
2 Uniformity of the N2O Furnace Oxynitride Process for the Formation of Thin Tunnel Dielectrics
Okada Y, Tabin PJ, Reid KG, Hegde RI, Ajuria SA
Journal of the Electrochemical Society, 141(12), 3500, 1994