화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Silane overpressure post-implant annealing of Al dopants in SiC: Cold wall CVD apparatus
Rao S, Bergamini F, Nipoti R, Saddow SE
Applied Surface Science, 252(10), 3837, 2006
2 Activation of implanted Al and co-implanted Al/C or Al/Si in 4H-SiC
Jones KA, Zheleva TS, Ervin MH, Shah PB, Derenge MA, Gerardi G, Freitas JA, Vispute RD
Materials Science Forum, 457-460, 929, 2004
3 The influence of substrate temperature on the evolution of ion implantation-induced defects in epitaxial 6H-SiC
Anwand W, Brauer G, Wirth H, Skorupa W, Coleman PG
Applied Surface Science, 194(1-4), 127, 2002
4 Improved p-type conductivity in heavily Al-doped SiC by ion-beam-induced nano-crystallization
Heera V, Madhusoodanan KN, Mucklich A, Panknin D, Skorupa W
Materials Science Forum, 433-4, 395, 2002
5 Real relationship between acceptor density and hole concentration in Al-implanted 4H-SiC
Matsuura H, Sugiyama K, Nishikawa K, Nagata T, Fukunaga N
Materials Science Forum, 433-4, 447, 2002
6 p-type doping of SiC by high dose Al implantation - Problems and progress
Heera V, Panknin D, Skorupa W
Applied Surface Science, 184(1-4), 307, 2001