1 |
Influence of deposition pressure and power on characteristics of RF-Sputtered Mo films and investigation of sodium diffusion in the films Akcay N, Sonmez NA, Zaretskaya EP, Ozcelik S Current Applied Physics, 18(5), 491, 2018 |
2 |
Effect of Ar bubbling during plasma electrolytic oxidation of AZ31B magnesium alloy in silicate electrolyte Lee J, Kim Y, Chung W Applied Surface Science, 259, 454, 2012 |
3 |
High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma Kim EH, Lee TY, Min BC, Chung CW Thin Solid Films, 521, 216, 2012 |
4 |
Inductively coupled plasma reactive ion etching of IrMn magnetic thin films using a CH4/O-2/Ar gas Lee TY, Kim EH, Chung CW Thin Solid Films, 521, 229, 2012 |
5 |
Self assembled micro masking effect in the fabrication of SiC nanopillars by ICP-RIE dry etching Kathalingam A, Kim MR, Chae YS, Sudhakar S, Mahalingam T, Rhee JK Applied Surface Science, 257(9), 3850, 2011 |
6 |
Investigation on etch characteristics of MgO thin films using a HBr/Ar plasma Kim EH, Bin Xiao Y, Kong SM, Chung CW Thin Solid Films, 519(20), 6820, 2011 |
7 |
Etch characteristics of FePt magnetic thin films using inductively coupled plasma reactive ion etching Kim EH, Bin Xiao Y, Kong SM, Chung CW Thin Solid Films, 519(23), 8223, 2011 |
8 |
Evaluation of thermoporometry for characterization of mesoporous materials Yamamoto T, Endo A, Inagi Y, Ohmori T, Nakaiwa M Journal of Colloid and Interface Science, 284(2), 614, 2005 |